The growth of the target erosion profile (racetrack) in DC magnetron sputtering has been experimentally studied at a modest target power. Unbalanced magnetron sputtering (UBMS) and balanced magnetron sputtering (BMS) of a copper target were conduc...
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B 35(2) 022204 2017年3月 [査読有り]
In this study, an array of Mo cones for volcano-structured Spindt-type microelectron emitters were fabricated. A recently developed triode high power pulsed magnetron sputtering system was used to control the positive plasma potential and efficien...
Sustainable Materials and Technologies 3 14-16 2015年4月 [査読有り]
A novel material for recovery and separation of precious metal using grape-derived waste has been developed. The material was fabricated glutaraldehyde-crosslinked polyphenol, which derived from grape-derived wastes. Adsorption performance of prec...
Journal of the Vacuum Society of Japan 58(7) 261-264 2015年 [査読有り]
The evolution of target "race track" erosion was evaluated experimentally during the conventional DC magnetron sputtering of metal targets with different Ar gas pressure environments. At gas pressures of 0.38, 0.5, and 1.0 Pa, an aluminum or coppe...
Japanese Journal of Applied Physics 53(3) 038002-038002 2014年 [査読有り]
We propose a method to obtain the pressure-distance product (pd) for thermalization in the sputtering process using a Monte Carlo (MC) simulation. Sputter-ejected atoms proceed forward with high energy, and fall into random motion finally. That is...
High power pulsed magnetron sputtering (HPPMS) is a variant of sputtering deposition method in that pulsed power is applied to the sputtering target with low repetition frequency and small duty ratio. It produces high density plasma intermittently...