Takeo Nakano   Ryo Yamazaki   Shigeru Baba   
Journal of the Vacuum Society of Japan 57(4) 152-154 2014年 [査読有り]
The transport process of sputtered atoms has been studied experimentally through deposition rate measurement by changing the target-to-substrate (T-S) distance systematically along with the gas pressure and target element. The deposition rate show...
Takeo Nakano   Takuya Umahashi   Shigeru Baba   
Japanese Journal of Applied Physics 53(2) 028001-028001 2014年 [査読有り]
We have designed a new triode configuration in a magnetron sputtering apparatus to control the plasma potential of the discharge. An additional chimney electrode was introduced above the conventional sputter gun to apply a positive voltage. The di...
Takeo Nakano   Takaaki Sekiya   Shigeru Baba   
Journal of the Vacuum Society of Japan 57(1) 16-22 2014年 [査読有り]
The incorporation of oxygen impurities under ambient environment conditions during reactive sputter deposition of titanium nitride (TiN) films has been studied. TiN films, prepared by DC sputtering of a Ti metal target in 100% N2 at 1 Pa in an ult...
Takeo Nakano   Norihiko Hirukawa   Shuhei Saeki   Shigeru Baba   
VACUUM 87 109-113 2013年1月 [査読有り]
In this study, we investigated the effect of the target bias voltage during the pulse-off period in the pulsed magnetron sputtering (PMS) of repetition frequency 200 Hz and duty ratio 5-20%. Copper films were deposited by the PMS for Ar gas pressu...
We propose Spindt-type field emitter array fabrication process using the high power impulse magnetron sputtering (HiPIMS) deposition. HiPIMS method can get a lot of ionized sputtering particles due to high plasma density. We think that highly coll...
High power pulsed magnetron sputtering (HPPMS) is a variant of sputtering deposition method in that pulsed power is applied to the sputtering target with low repetition frequency and small duty ratio. It produces high density plasma intermittently...