Takeo Nakano   Chieko Murata   Shigeru Baba   
VACUUM 84(12) 1368-1371 2010年6月 [査読有り]
With a high-power impulse magnetron sputtering (HiPIMS) apparatus, it has been studied how the target bias voltage during the off-pulse period affects the stability of the generated plasma. We have prepared an electrical pulse power source which c...
Takeo Nakano   Ken&apos   ichiroh Hoshi   Shigeru Baba   
VACUUM 83(3) 467-469 2008年10月 [査読有り]
The effect of the base pressure on the incorporation of oxygen into reactively magnetron-sputtered metal-nitride films has been investigated. A UHV sputtering system with a base pressure of less than 10(-6) Pa was used to examine the relationship ...
The effect of background gas environment on the purity of reactively-deposited nitride films has been studied. Especially, the relation between the oxygen background pressure and its incorporation into the TiN film is investigated in this study. W...
Takeo Nakano   Takashi Fujimoto   Daisuke Nakada   Shigeru Baba   
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS 45(10A) 7875-7878 2006年10月 [査読有り]
The ion-induced secondary electron emission (SEE) characteristics of sputter-deposited magnesium oxide (MgO) films have been investigated. Using an RF magnetron sputtering apparatus, MgO films of 50-200nm thickness were deposited on Si substrates ...
High power pulsed magnetron sputtering (HPPMS) is a variant of sputtering deposition method in that pulsed power is applied to the sputtering target with low repetition frequency and small duty ratio. It produces high density plasma intermittently...