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Researcher List >> Takeo Watanabe
 

Takeo Watanabe

 
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NameTakeo Watanabe
URLhttps://www.lasti.u-hyogo.ac.jp/english/index.html
AffiliationUniversity of Hyogo
SectionCenter for EUVL, Laboratory of Advanced Science and Technology for Industry
Job titleFull professor
DegreePh.D.(Osaka City University)
J-Global ID200901004223661630

Research Interests

 
Electronic device・Instrumentation engineering ,Applied optics・quantum optical enginnering

Research Areas

 
  • Manufacturing technology (mechanical, electrical/electronic, chemical engineering) / Electronic devices and equipment / 
  • Nanotechnology/Materials / Optical engineering and photonics / 

Research History

 
Apr 2022
 - 
Today
University of Hyogo  Executive Advisor to the President 
 
Apr 2022
 - 
Today
University of Hyogo Laboratory of Advanced Science and Technology for Industry Executive Advisor to Director 
 
Apr 2015
 - 
Today
University of Hyogo Center for EUVL, Laboratory of Advanced Science and Technology for Industry Director 
 
Apr 2015
 - 
Today
University of Hyogo Laboratory of Advanced Science and Technology for Industry Professor 
 
Dec 2021
 - 
Mar 2022
University of Hyogo  Executive Advisor to the President 
 

Education

 
Apr 1987
 - 
Sep 1990
Osaka City University  Physics
 

Committee Memberships

 
Apr 2019
 - 
Today
Photomask Japan  Conference chair
 
Jan 2013
 - 
Today
International Conference on Electron Ion Photon Beam Technology and Nanofabrication  Program Committee
 
Apr 2006
 - 
Today
International Conference on Photopolymer Science and Technology  International Affairs, Director
 
Apr 2006
 - 
Today
International Conference on Photopolymer Science and Technology  Organizing Committee
 
Apr 2005
 - 
Today
International Conference on Photopolymer Science and Technology  Program Committee
 

Awards

 
May 2016
Osaka Nuclear Society Association, The Award of Osaka Nuclear Society Association,Resist Research and Development using SR
WATANABE Takeo 
 
Jun 2013
International Workshop on EUV Lithography, Best Paper Award,R&D of EUV Lithography
WATANABE Takeo 
 
Jun 2008
International Workshop on EUV Lithography, Best Poster Award 1st Place,EUV interference lithography employing 11-m long undulator as a light source
WATANABE Takeo 
 
Mar 2002
The Physical Society of Japan, The 7th Outstanding Paper Award of the Physical Society of Japan,Direct Observation of Sequential Weak Decay of a Double Hypernucleus
渡邊健夫 
 

Papers

 
 
Kensuke Murashima   Yuki Kawashima   Shuhei Ozaki   Atsushi Tatami   Masamitsu Tachibana   Takeo Watanabe   Tetsuo Harada   Mutsuaki Murakami   
CARBON   181 348-357   Aug 2021
Using a newly developed edge-support heat treatment method of polyimide, self-standing graphite thin films (GTFs) with a frame were prepared. The graphite basal plane in the GTF was oriented in the direction of the film surface, resulting in GTFs ...
 
Tetsuo Harada   Shinji Yamakawa   Mitsunori Toyoda   Takeo Watanabe   
Japanese Journal of Applied Physics   60(8) 087005-087005   Aug 2021
Extreme ultraviolet (EUV) lithography has recently been utilized as a high-volume manufacturing technology for advanced semiconductors. An EUV mirror can be easily contaminated in the existence of a residual hydrocarbon vapor gas inside an exposur...
 
Hiroya Shike   Rihito Kuroda   Ryota Kobayashi   Maasa Murata   Yasuyuki Fujihara   Manabu Suzuki   Shoma Harada   Taku Shibaguchi   Naoya Kuriyama   Takaki Hatsui   Jun Miyawaki   Tetsuo Harada   Yuichi Yamasaki   Takeo Watanabe   Yoshihisa Harada   Shigetoshi Sugawa   
IEEE TRANSACTIONS ON ELECTRON DEVICES   68(4) 2056-2063   Apr 2021
This article presents a prototype 22.4 mu m pixel pitch global shutter (GS) wide dynamic range (WDR) soft X-ray CMOS image sensor (sxCMOS). Backside-illuminated (BSI) pinned photodiodes with a 45-mu m thick Si substrate were introduced for low noi...
 
Takuto Fujii   Shinji Yamakawa   Tetsuo Harada   Takeo Watanabe   
Proceedings of SPIE - The International Society for Optical Engineering   11908    2021
In 2019, EUV lithography technology with a wavelength of 13.5 nm was used for the mass production of semiconductor logic devices with 7 nm node. As with small feature size of electronic circuits in semiconductor device will be required in the futu...
 
Tetsuo Harada   Ayato Ohgata   Shinji Yamakawa   Takeo Watanabe   
Proceedings of SPIE - The International Society for Optical Engineering   11908    2021
At EUV lithography, an EUV mirror can be easily contaminated with carbon. This carbon contamination causes the reflectance drop of the Mo/Si multilayer mirror. For the carbon-contamination cleaning, hydrogen gas is introduced at a pressure of a fe...

Misc.

 
 
原田哲男   渡邊健夫   
UV/EB研究会資料   69th    2018
 
新原章汰   豆崎大輝   渡辺雅紀   原田哲男   渡邊健夫   
日本放射光学会年会・放射光科学合同シンポジウム(Web)   31st    2018
 
佐藤芙貴   原田哲男   渡邊健夫   
日本放射光学会年会・放射光科学合同シンポジウム(Web)   31st    2018
 
豆崎大輝   原田哲男   永田豊   渡邊健夫   
日本放射光学会年会・放射光科学合同シンポジウム(Web)   31st    2018
 
中谷侑亮   原田哲男   高野敦志   山田素行   渡邊健夫   
日本放射光学会年会・放射光科学合同シンポジウム(Web)   31st    2018

Books and Other Publications

 
 
渡邊 健夫(Part:Contributor, 第8章 UV硬化型ソルダーレジスト、フォトレジストの設計と評価 第7節 EUVレジストのアウトガス評価、反応解析)
株式会社技術情報協会   Nov 2017      
 
渡邊 健夫(Part:Contributor, EUVリソグラフィー技術)
(株)シーエムシー出版   Sep 2017      
 
渡邊 健夫(Part:Contributor, 第2章 EUVリソグラフィ技術、第2節 EUV干渉露光技術)
株式会社エヌ・ティー・エス   Apr 2017      
 
渡邊 健夫(Part:Sole author, 「EUVレジストの最前線」)
一般財団法人 放射線利用振興協会編   2017      
 
渡邊 健夫(Part:Contributor, 巻頭言 「産学連携に思うこと」)
2015      

Presentations

 
 
渡邊 健夫   
大阪大学産業科学研究所附属量子ビーム科学研究施設,平成30年度施設研究会~量子ビーム科学の進展と新しい応用の広がり~   17 Dec 2018   [Invited]
 
Takeo Watanabe   Tetsuo Harada   
Physics of X-ray and Neutron Multilayer Structures (PXRNMS2018)   7 Nov 2018   
 
渡邊健夫   
兵庫県立大学名誉教授会   4 Oct 2018   [Invited]
 
Takeo Watanabe   Tetsuo Harada   
Micro Nano Engineering 2018   24 Sep 2018   
 
Takeo Watanabe   
Polymer World Congress 2018   3 Sep 2018   [Invited]

Professional Memberships

 
Apr 2000
 - 
Today
高分子学会
Apr 1998
 - 
Today
日本放射光学会
Apr 1991
 - 
Today
日本応用物理学会
Apr 1985
   
 
日本物理学会
 
   
 
SPIE

Research Projects

 
 
Precise measurement of optical constants of thin films in soft X-ray region
Japan Society for the Promotion of Science: Grants-in-Aid for Scientific Research Grant-in-Aid for Scientific Research (B)
Kinoshita Hiroo WATANABE Takeo MURAMATSU Yasuji 
Project Year: Apr 2015 - Mar 2018
 
Development of 1X nm EUV Resist with high sensitivity and Low LWR
Japan Society for the Promotion of Science: Grants-in-Aid for Scientific Research Grant-in-Aid for Scientific Research (B)
Watanabe Takeo HARADA Tetsuo KINOSHITA Hiroo MUTO Masao TSUNO Katsushige 
Project Year: Apr 2013 - Mar 2016
 
Resist pattern replication using EUV interference lithography for 20 nm and below
Japan Society for the Promotion of Science: Grants-in-Aid for Scientific Research Grant-in-Aid for Scientific Research (B)
WATANABE Takeo KINOSHITA Hiroo HARADA Tetsuo SHIONO Daiju 
Project Year: 2010 - 2012
 
Chemical genetics on protein acetylation, a key reaction regulating biological functions
Japan Society for the Promotion of Science: Grants-in-Aid for Scientific Research Grant-in-Aid for Scientific Research (A)
YOSHIDA Minoru YASHIRODA Yoko YOSHIDA Yukiko KAMEMURA Kazuo 
Project Year: 2003 - 2005
 
Fabrication of aspherical surfaces for soft X-Ray optical elements by means of Deposition techniques
Japan Society for the Promotion of Science: Grants-in-Aid for Scientific Research Grant-in-Aid for Scientific Research (C)
NIIBE Masahito WATANABE Takeo KINOSHITA Hiroo 
Project Year: 1999 - 2001

Media Coverage

 
 
 
MBSラジオ   こんちわコンちゃんお昼です   May 2021   [TV or radio program]
 
MBSラジオ   日曜コンちゃん おはようさん   May 2021   [TV or radio program]
 
 
MBSラジオ   日曜コンちゃん おはようさん   May 2021   [TV or radio program]