International Conference of Photopolymer Science and Technology, Outstanding Contributions A ward渡邊健夫
Jul 2022
研究活動教員表彰, 最優秀賞渡邊健夫
May 2016
Osaka Nuclear Society Association, The Award of Osaka Nuclear Society Association,Resist Research and Development using SRWATANABE Takeo
Jun 2013
International Workshop on EUV Lithography, Best Paper Award,R&D of EUV LithographyWATANABE Takeo
Jun 2008
International Workshop on EUV Lithography, Best Poster Award 1st Place,EUV interference lithography employing 11-m long undulator as a light sourceWATANABE Takeo
Proceedings of SPIE - The International Society for Optical Engineering 12750 2023
Development of new EUV resists is required for next-generation EUV lithography. A resist in which a large amount of photoacid generator (PAG) is introduced into the polymer side chain has been reported as a high-resolution nonchemically amplified ...
The R&D of basic technologies such as mask, resist, optical element, optics. have been carried out at NewSUBARU synchrotron light facility since 1996. EUV Lithography started use in production from 2019 for 7 nm node logic devices and from 2020 fo...
Development of 1X nm EUV Resist with high sensitivity and Low LWRJapan Society for the Promotion of Science: Grants-in-Aid for Scientific Research Grant-in-Aid for Scientific Research (B)Watanabe Takeo HARADA Tetsuo KINOSHITA Hiroo MUTO Masao TSUNO Katsushige