The 9th Japan-China-Korea Joint Conference on MEMS/NEMS, Best Presentation Award,Characteristics of new deep X-ray lithography beamline (BL11) at NewSUBARUMasaya Takeuchi, Akinobu Yamaguchi, and Yuichi Utsumi
Japanese Journal of Applied Physics 62 2023年4月 [査読有り]
Abstract
Atomic layer etching (ALE) of silicon nitride film (SiNx) was demonstrated using oxygen gas cluster ion beam (O2-GCIB) with acetylacetone (Hacac) as adsorption gas. GCIB is a beam of aggregates of several thousand atoms, enabling low da...
S. Hanahara   M. Takeuchi   N. Toyoda   
Japanese Journal of Applied Physics 61(SF) SF1004-SF1004 2022年6月 [査読有り]
Abstract
Surface-activated bonding (SAB) of Cu by gas cluster ion beam (GCIB) irradiation with acetic acid vapor was studied. GCIB irradiation realizes surface smoothing and surface reaction enhancement without severe damage. Therefore, it is pr...