Hideaki Tanimura   Yuto Ota   Hikaru Kawarazaki   Shinichi Kato   Yasuo Nara   
Japanese Journal of Applied Physics 62 2023年4月
We used millisecond flash lamp annealing (FLA) to form thin ferroelectric Hf0.5Zr0.5O2 (HZO) films with thicknesses of less than 10 nm and with remanent polarization up to 30 μC cm−2. A clear dependency of the polarization on the annealing tempera...