Ippei Tanaka   Tomoya Ikeda   Toshimitsu Nakano   Hiroyuki Kousaka   Tatsuya Furuki   
Japanese Journal of Applied Physics 58 2019年2月 [査読有り]
© 2018 The Japan Society of Applied Physics. Si-doped diamond-like carbon (a-C:H:Si) films can be deposited at an ultra-high rate around 100 μm h-1 by using microwave sheath-voltage combination plasma (MVP), showing a friction coefficient of 0.05-...