Yosuke Ohta   Atsushi Sekiguchi   Shinji Yamakawa   Tetsuo Harada   Takeo Watanabe   Hiroki Yamamoto   
Journal of Photopolymer Science and Technology 35(1) 49-54 2022年12月 [査読有り]
It has been reported that the good correlation in sensitivity and resolution between EUV exposure and EB exposure because of the similar mechanism of the photochemical-reaction in photoresists during exposure. However, in the early stages of EUV r...