Takeharu Motokawa   MacHiko Suenaga   Kazuki Hagihara   Noriko Iida Nee Sakurai   Ryu Komatsu   Hideaki Sakurai   Shingo Kanamitsu   Keisuke Tsuda   Tetsuo Harada   Takeo Watanabe   
Proceedings of SPIE - The International Society for Optical Engineering 11518 2020年
© COPYRIGHT SPIE. Downloading of the abstract is permitted for personal use only. An essential element of sub-15 nm nanoimprint lithography is to create fine patterns on a template. However, it is challenging to create sub-15 nm half-pitch pattern...