Atsushi Sekiguchi   Yoko Matsumoto   Mariko Isono   Michiya Naito   Yoshiyuki Utsumi   Tetsuo Harada   Takeo Watanabe   
EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY IX 10583 2018年 [査読有り]
To improve EUV resist sensitivity, studies have sought to enhance EUV light absorption by adding metals characterized by high EUV light absorption to the resist polymer. This approach is intended to increase secondary electron emission, thereby en...