Shohei Miki   Koji Iguchi   Sho Kitano   Koki Hayakashi   Yasushi Hotta   Haruhiko Yoshida   Atsushi Ogura   Shin-ichi Satoh   Koji Arafune   
JAPANESE JOURNAL OF APPLIED PHYSICS 54(8) 2015年8月 [査読有り]
Aluminum oxide (AlOx) films were deposited by mist chemical vapor deposition (MCVD) in air for p-type crystalline silicon, and the effects of the deposition temperature (T-dep) and AlOx film thickness on the maximum surface recombination velocitie...