JAPANESE JOURNAL OF APPLIED PHYSICS 52(5) 2013年5月 [査読有り]
Gas cluster ion beam (GCIB) etching of etch-resistant materials under acetic acid vapor was studied for development of new manufacturing process of future nonvolatile memory. Etching depths of various etch-resistant materials (Pt, Ru, Ta, CoFe) wi...
K. Sumie   N. Toyoda   I. Yamada   
Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms 307 290-293 2013年 [査読有り]
The dependence of surface morphology and sputtering yield of SiO 2 thin films on the incident angle of gas cluster ion beams (GCIBs) was studied. When the incident angles (h) were either 0° or 30° ripples did not form on the surface of SiO2, and t...
A gas cluster is an aggregate of a few to several thousands of gaseous atoms or molecules, and it can be accelerated to a desired energy after ionization. Since the kinetic energy of an atom in a cluster is equal to the total energy divided by the...
Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms 307 269-272 2013年 [査読有り]
In this study, charge states of gas cluster ions were evaluated from observations of individual impact craters. Since the diameter of craters formed by gas cluster ion impact increases in proportion to the cubic root of the acceleration energy, an...
Takanori Suda   Noriaki Toyoda   Ken-ichi Hara   Isao Yamada   
JAPANESE JOURNAL OF APPLIED PHYSICS 51(8) 2012年8月 [査読有り]
Cu etching was carried out at a low substrate temperature using a gas cluster ion beam (GCIB) under an acetic acid gas atmosphere. A very shallow Cu surface was oxidized by O-2-GCIB irradiation. Reactions between copper oxide and acetic acid occur...