S Inoue   T Ohba   H Takata   K Koterazawa   
THIN SOLID FILMS 343 230-233 1999年4月
The influence of nitrogen partial pressure (P(N2)) and argon partial pressure (P(Ar)) on internal stress, crystallographic structure, and resistivity have been investigated for reactively sputtered Ti-N films in order to get some insight into the ...