Shinji Yamakawa   Ako Yamamoto   Seiji Yasui   Takeo Watanabe   Tetsuo Harada   
Journal of Photopolymer Science and Technology 34(1) 111-115 2021年6月 [査読有り]
In extreme ultraviolet (EUV) lithography development, the reduction of line width roughness (LWR) is a one of the significant issues. It has been reported that the LWR of photoacid generator (PAG) bounded resist is lower than that of PAG blended r...