Takuto Fujii Shinji Yamakawa Tetsuo Harada Takeo Watanabe
Photomask Japan 2021: XXVII Symposium on Photomask and Next-Generation Lithography Mask Technology 11908 2021年8月 [査読有り]
In 2019, EUV lithography technology with a wavelength of 13.5 nm was used for the mass production of semiconductor logic devices with 7 nm node. As with small feature size of electronic circuits in semiconductor device will be required in the futu...
大学本部
高度産業科学技術研究所