Hiroto Kudo   Mari Fukunaga   Teppei Yamada   Shinji Yamakawa   Takeo Watanabe   Hiroki Yamamoto   Kazumasa Okamoto   Takahiro Kozawa   
Journal of Photopolymer Science and Technology 32(6) 805-810 2020年1月 [査読有り]
© 2019SPST. We examined the synthesis and resist properties of tellurium-containing molecular resist materials. By the condensation reaction of anisol, phenol, and 2-phenylphenol with tellurium tetrachloride (TeCl4), dichloro di(4-hydroxyphenyl) t...