東 欣吾

Titanium Silicon Nitride Films with Low Silicon Content Deposited via Reactive High-Power Pulsed Sputtering Penning Discharge

IEEE Transactions on Plasma Science 49(1) 53-60 2021年1月1日  

Preparation of silicon-doped diamond-like carbon films with electrical conductivity by reactive high-power impulse magnetron sputtering combined with a plasma-based ion implantation system

DIAMOND AND RELATED MATERIALS 101 2020年1月  査読有り

Effect of a Magnetic Filter Across the Exit Hole of a Flat Oxygen Plasma Source

PLASMA AND FUSION RESEARCH 14 2019年6月  査読有り

Preparation of titanium carbon nitride films by reactive high power pulsed sputtering Penning discharges

VACUUM 157 192-201 2018年11月  査読有り

Plasma based nitrogen ion implantation to hydrogenated diamond-like carbon films

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS 433 87-92 2018年10月  査読有り