Kingo Azuma

Titanium Silicon Nitride Films with Low Silicon Content Deposited via Reactive High-Power Pulsed Sputtering Penning Discharge

IEEE Transactions on Plasma Science, 49(1) 53-60, Jan 1, 2021  

Preparation of silicon-doped diamond-like carbon films with electrical conductivity by reactive high-power impulse magnetron sputtering combined with a plasma-based ion implantation system

DIAMOND AND RELATED MATERIALS, 101, Jan, 2020  Peer-reviewed

Effect of a Magnetic Filter Across the Exit Hole of a Flat Oxygen Plasma Source

PLASMA AND FUSION RESEARCH, 14, Jun, 2019  Peer-reviewed

Preparation of titanium carbon nitride films by reactive high power pulsed sputtering Penning discharges

VACUUM, 157 192-201, Nov, 2018  Peer-reviewed

Plasma based nitrogen ion implantation to hydrogenated diamond-like carbon films

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 433 87-92, Oct, 2018  Peer-reviewed