Researcher List Kingo Azuma Kingo Azuma (東 欣吾) Please select the form format to download from below 「Education and research environment」format 「No. 4, the Ministry of Education document style ①Outline for Vitae」format 「No. 4, the Ministry of Education document style ②Education and research environment」format Profile Information AffiliationUniversity of HyogoJ-GLOBAL ID201801007461664558researchmap Member IDB000326969 Research Areas 1 Manufacturing technology (mechanical, electrical/electronic, chemical engineering) / Electrical power engineering / Papers 61 Titanium Silicon Nitride Films with Low Silicon Content Deposited via Reactive High-Power Pulsed Sputtering Penning Discharge Takashi Kimura, Ryo Yoshida, Kingo Azuma IEEE Transactions on Plasma Science, 49(1) 53-60, Jan 1, 2021 Preparation of silicon-doped diamond-like carbon films with electrical conductivity by reactive high-power impulse magnetron sputtering combined with a plasma-based ion implantation system Yuki Shibata, Takashi Kimura, Setsuo Nakao, Kingo Azuma DIAMOND AND RELATED MATERIALS, 101, Jan, 2020 Peer-reviewed Effect of a Magnetic Filter Across the Exit Hole of a Flat Oxygen Plasma Source Norihiro Kodama, Haruhiko Himura, Kingo Azuma, Katsuyoshi Tsumori, Haruhisa Nakano PLASMA AND FUSION RESEARCH, 14, Jun, 2019 Peer-reviewed Preparation of titanium carbon nitride films by reactive high power pulsed sputtering Penning discharges Takashi Kimura, Ryo Yoshida, Kingo Azuma, Setsuo Nakao VACUUM, 157 192-201, Nov, 2018 Peer-reviewed Plasma based nitrogen ion implantation to hydrogenated diamond-like carbon films Takashi Kimura, Hidekazu Yanai, Setsuo Nakao, Kingo Azuma NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 433 87-92, Oct, 2018 Peer-reviewed More Misc. 96 Influence of Burst Pulsed Voltage Biasing to a substrate on MoN deposition by unbalanced HiPIMS 東欣吾, 金田和彦, 田中達也, 岡好浩 電気学会全国大会講演論文集(CD-ROM), 2021, 2021 An inductively coupled plasma generation by LC series resonance 東欣吾, 西川晶, 岡好浩 電気学会研究会資料, (EPP-20-046-055.057-058), 2020 Discharge characteristics of tantalum plasma source by Penning type pulsed sputtering discharge 2019(95) 13-16, Oct 25, 2019 Preliminary experiment of gas discharge against sonic flow using inductive energy storage type pulsed voltage generator 2019(41) 55-58, May 16, 2019 パルススパッタペニング放電による熱可塑性樹脂基板上への窒化チタン薄膜の作製 東欣吾, 永井僚, 田中達也, 岡好浩 電気学会全国大会講演論文集(CD-ROM), 2019, 2019 More Books and Other Publications 1 プラズマイオンプロセスとその応用 電気学会, 電気学会・プラズマイオン高度利用プロセス調査専門委員会 オーム社, Oct, 2005 (ISBN: 4274201236) Professional Memberships 1 電気学会 Industrial Property Rights 38 特願2000-223073 生体用インプラント部材 特願平10-142465 プラズマ処理方法及びプラズマ処理装置 特願平10-071924 磁気フィルタ 特願平09-304037 プラズマ生成加速装置 特願平09-204335 ガス処理装置 More
Kingo Azuma (東 欣吾) Please select the form format to download from below 「Education and research environment」format 「No. 4, the Ministry of Education document style ①Outline for Vitae」format 「No. 4, the Ministry of Education document style ②Education and research environment」format Profile Information AffiliationUniversity of HyogoJ-GLOBAL ID201801007461664558researchmap Member IDB000326969 Research Areas 1 Manufacturing technology (mechanical, electrical/electronic, chemical engineering) / Electrical power engineering / Papers 61 Titanium Silicon Nitride Films with Low Silicon Content Deposited via Reactive High-Power Pulsed Sputtering Penning Discharge Takashi Kimura, Ryo Yoshida, Kingo Azuma IEEE Transactions on Plasma Science, 49(1) 53-60, Jan 1, 2021 Preparation of silicon-doped diamond-like carbon films with electrical conductivity by reactive high-power impulse magnetron sputtering combined with a plasma-based ion implantation system Yuki Shibata, Takashi Kimura, Setsuo Nakao, Kingo Azuma DIAMOND AND RELATED MATERIALS, 101, Jan, 2020 Peer-reviewed Effect of a Magnetic Filter Across the Exit Hole of a Flat Oxygen Plasma Source Norihiro Kodama, Haruhiko Himura, Kingo Azuma, Katsuyoshi Tsumori, Haruhisa Nakano PLASMA AND FUSION RESEARCH, 14, Jun, 2019 Peer-reviewed Preparation of titanium carbon nitride films by reactive high power pulsed sputtering Penning discharges Takashi Kimura, Ryo Yoshida, Kingo Azuma, Setsuo Nakao VACUUM, 157 192-201, Nov, 2018 Peer-reviewed Plasma based nitrogen ion implantation to hydrogenated diamond-like carbon films Takashi Kimura, Hidekazu Yanai, Setsuo Nakao, Kingo Azuma NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 433 87-92, Oct, 2018 Peer-reviewed More Misc. 96 Influence of Burst Pulsed Voltage Biasing to a substrate on MoN deposition by unbalanced HiPIMS 東欣吾, 金田和彦, 田中達也, 岡好浩 電気学会全国大会講演論文集(CD-ROM), 2021, 2021 An inductively coupled plasma generation by LC series resonance 東欣吾, 西川晶, 岡好浩 電気学会研究会資料, (EPP-20-046-055.057-058), 2020 Discharge characteristics of tantalum plasma source by Penning type pulsed sputtering discharge 2019(95) 13-16, Oct 25, 2019 Preliminary experiment of gas discharge against sonic flow using inductive energy storage type pulsed voltage generator 2019(41) 55-58, May 16, 2019 パルススパッタペニング放電による熱可塑性樹脂基板上への窒化チタン薄膜の作製 東欣吾, 永井僚, 田中達也, 岡好浩 電気学会全国大会講演論文集(CD-ROM), 2019, 2019 More Books and Other Publications 1 プラズマイオンプロセスとその応用 電気学会, 電気学会・プラズマイオン高度利用プロセス調査専門委員会 オーム社, Oct, 2005 (ISBN: 4274201236) Professional Memberships 1 電気学会 Industrial Property Rights 38 特願2000-223073 生体用インプラント部材 特願平10-142465 プラズマ処理方法及びプラズマ処理装置 特願平10-071924 磁気フィルタ 特願平09-304037 プラズマ生成加速装置 特願平09-204335 ガス処理装置 More